发明名称 Method for fabricating a semiconductor device with bipolar transistor
摘要 A semiconductor device with a bipolar transistor that enables to realize a reliable, electric connection of an intrinsic base region with a base electrode is provided. A semiconductor substructure has a surface area. An intrinsic base region is formed in the surface area. An emitter region is formed in the surface area to be surounded by the intrinsic base region, and an emitter electrode is formed to be contacted with the emitter region. An insulator is formed to surround the emitter electrode. A base electrode is formed not to be contacted with the intrinsic base region A conductive region is formed to be contacted with the intrinsic base region and the base electrode. The substructure has a recess formed on the surface area. The conductive region is produced by supplying a conductive material to the recess to be contacted with the intrinsic base region and the base electrode. The intrinsic base region is electrically connected to the base electrode through the conductive region. The recess is preferably produced by oxidizing a part of the surface area to form an oxide and removing the oxide.
申请公布号 US5843828(A) 申请公布日期 1998.12.01
申请号 US19960593416 申请日期 1996.01.29
申请人 NEC CORPORATION 发明人 KINOSHITA, YASUSHI
分类号 H01L29/73;H01L21/331;H01L29/423;H01L29/732;(IPC1-7):H01L21/326 主分类号 H01L29/73
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