发明名称 THIN-FILM TRANSISTOR SUBSTRATE AND MANUFACTURE THEREOF
摘要 A method of fabricating a thin film transistor of an inverted stagger structure having a gate terminal, a gate insulator a semiconductor film, a source electrode and a drain electrode formed in that order; a gate terminal and a gate wiring are provided for supplying a scanning signal to the gate electrode; and a source terminal and a source wiring are provided for supplying a data signal to the source electrode, wherein the gate terminal is formed on an upper side of the gate insulating film and electrically connected to the gate wiring through a contact hole formed in the gate insulator.
申请公布号 KR0154347(B1) 申请公布日期 1998.12.01
申请号 KR19940029685 申请日期 1994.11.12
申请人 FRONTEC INC. 发明人 SASAKI, MAKOTO;FUKUI, HIROFUMI;MIYAZAKI, MASANORI;SEKI, HITOSHI;KASAMA, ASUHIKO
分类号 G02F1/136;G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L29/78;H01L29/786;(IPC1-7):H01L21/02 主分类号 G02F1/136
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