发明名称 |
Remote plasma source |
摘要 |
The present invention provides a remote plasma source mountable on a process chamber and connectable on one end to a gas inletting system and on the other end to a gas distribution system disposed in a process chamber. Preferably, a conventional microwave generator is utilized to deliver microwaves into a remote chamber to excite a gas passed therethrough into an excited state.
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申请公布号 |
US5844195(A) |
申请公布日期 |
1998.12.01 |
申请号 |
US19960751486 |
申请日期 |
1996.11.18 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
FAIRBAIRN, KEVIN;PONNEKANTI, HARI K.;CHEUNG, DAVID;TANAKA, TSUTOMU;KELKA, MALCAL |
分类号 |
C23C14/56;C23C16/50;C23C16/511;H01L21/00;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):B23K10/00 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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