发明名称 |
Low density film for low dielectric constant applications |
摘要 |
A film having a dielectric constant of less than 3 (most preferably less than 2) and comprising a layer of particles and a deposit on top of and within the particle layer, and a method of making same. The particles are agglomerated particles, hollow particles, porous particles, or a combination thereof. The film is substantially planar on its surface, and the film is substantially impermeable to gases. The method comprises coating a substrate with the particles (preferably spin-coating a colloidal solution); drying the particles to form a substantially uniform particle layer; depositing a deposit onto the particle layer (preferably by low pressure chemical vapor deposition and causing chemical vapor infiltration to bond the particles to the substrate); and optionally polishing/planarizing the deposit surface (preferably by chemical mechanical polishing). |
申请公布号 |
AU7371898(A) |
申请公布日期 |
1998.11.27 |
申请号 |
AU19980073718 |
申请日期 |
1998.05.06 |
申请人 |
DANIEL J. SKAMSER;TOIVO T. KODAS;MARK J. HAMPDEN-SMITH |
发明人 |
DANIEL J. SKAMSER;TOIVO T. KODAS;MARK J. HAMPDEN-SMITH |
分类号 |
C03C17/00;C08K7/24;C08K7/26;H01L21/316 |
主分类号 |
C03C17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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