Verfahren und Vorrichtung zur Reinigung von Substratoberflächen
摘要
The invention relates to a method for cleaning substrate surfaces in which the substrate (11) is brought into contact with ozone in an aqueous solution. In order to guarantee rapid and quantitative cleaning of organic substances sticking to the substrate surface, the invention proposes extensively saturating the solution with ozone under overpressure and bringing the solution, which is under overpressure, into contact with the substrate (11).
申请公布号
DE19701971(C1)
申请公布日期
1998.11.26
申请号
DE1997101971
申请日期
1997.01.22
申请人
INVENT GMBH - ENTWICKLUNG NEUER TECHNOLOGIEN, 91080 UTTENREUTH, DE;FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN, DE
发明人
GENENGER, BERND, 91077 HETZLES, DE;MESMANN, KLAUS, 93049 REGENSBURG, DE
