REMOVAL OF TECHNETIUM IMPURITIES FROM URANIUM HEXAFLUORIDE

摘要

Processes for the removal of technetium from contaminated uranium hexafluoride containing technetium, typically as technetium-99 (<99>Tc) in nominal chemical forms are provided. The processes involve contacting the contaminated uranium hexafluoride in liquid form with a metal fluoride, typically magnesium fluoride (MgF2), for a period of time sufficient for the technetium to become adsorbed onto the metal fluoride thereby producing a purified uranium hexafluoride liquid; and removing the purified uranium hexafluoride liquid from the metal fluoride having adsorbed technetium.