发明名称 |
Photosensitive resin composition |
摘要 |
<p>There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): <CHEM> wherein R<1> represents <CHEM> and R<2> represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.</p> |
申请公布号 |
EP0642057(B1) |
申请公布日期 |
1998.11.25 |
申请号 |
EP19940306413 |
申请日期 |
1994.08.31 |
申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
HAGIWARA, HIDEO;KAJI, MAKOTO;NUNOMURA, MASATAKA |
分类号 |
G03F7/008;C08G73/10;G03F7/012;G03F7/027;G03F7/028;G03F7/037;G03F7/038;G03F7/075;H01L21/027;H01L21/312;H05K1/00;(IPC1-7):G03F7/037 |
主分类号 |
G03F7/008 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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