| 摘要 |
An automatic visual inspection system causes a light beam (LB10) to sweep an area of a semiconductor wafer (WF) for producing pieces of image data, checks the pieces of image data to see whether or not a defect is incorporated in an layout in the area, and the automatic visual inspection system not only determines the location of the defect but also categorizes the defect in one of defect modes so as to complete the visual inspection within short time. <IMAGE> |
