发明名称 PHENOLIC DENDRIMER COMPOUND AND RADIATION-SENSITIVE COMPOSITION CONTAINING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain the subject new compound useful for the production of a radiation-sensitive composition excellent in sensitivity and resolution. SOLUTION: This compound is expressed by formula I [R<1> , R<2> , R<3> , R<4> , R<5> , R<6> , R<7> and R<8> are each H, OH, a halogen, an alkyl, etc.; X is a single bond or bivalent group expressed by formula II (R<9> and R<10> are each H, an alkyl or aryl); (n) is 3-8], e.g. a phenolic dendrimer compound expressed by formula III. The compound of formula I is obtained by reacting a methylhydroxybenzoate compound with allyl bromide in the presence of K2 CO3 and sodium iodide in an organic solvent, reducing the reaction product with a reducing agent, such as lithium alminum hydride in a solvent, such as tetrahydrofuran, then, reacting the resulting product with carbon tetrabromide in the presence of triphenyphosphine in a solvent, such as tetrahydrofuran, finally, followed by reaction of the above reaction product with a cyclic phenoilc compound in the presence of 18-crown-6-ether and potassium carbonate in a suitable solvent.
申请公布号 JPH10310545(A) 申请公布日期 1998.11.24
申请号 JP19970136066 申请日期 1997.05.09
申请人 JSR CORP 发明人 UEDA MITSURU
分类号 G03F7/022;C07C43/23;G03F7/038;H01L21/027;(IPC1-7):C07C43/23 主分类号 G03F7/022
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