发明名称 Metal complex source reagents for chemical vapor deposition
摘要 A metalorganic complex of the formula:MAyXwherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAy with X; y is an integer having a value of 2, 3 or 4; each of the A ligands may be the same or different; and X is a monodentate or multidentate ligand coordinated to M and containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F. The metal M may be selected from the group consisting of Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Bi, Tl, Y, Pb, Ni, Pd, Pt, Al, Ga, In, Ag, Au, Co, Rh, Ir, Fe, Ru, Sn, Li, Na, K, Rb, Cs, Ca, Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W. A may be selected from the group consisting of beta -diketonates and their sulfur and nitrogen analogs, beta -ketoesters and their sulfur and nitrogen analogs, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases. X may for example comprise a ligand such as tetraglyme, tetrahydrofuran, bipyridine, crown ether, or thioether.
申请公布号 US5840897(A) 申请公布日期 1998.11.24
申请号 US19950477797 申请日期 1995.06.07
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 KIRLIN, PETER S.;BROWN, DUNCAN W.;BAUM, THOMAS H.;VAARSTRA, BRIAN A.;GARDINER, ROBIN A.
分类号 H01L21/31;C07F1/08;C07F3/00;C07F3/04;C07F5/00;C07F7/00;C07F7/28;C07F9/00;C07F11/00;C07F19/00;C23C16/00;C23C16/18;C23C16/30;C23C16/40;C23C16/448;G01T5/08;G02B6/02;G02B6/036;H01L39/24;(IPC1-7):C07F9/00;C07F15/00;C07D213/22 主分类号 H01L21/31
代理机构 代理人
主权项
地址