发明名称 |
MATERIAL EVALUATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a material evaluating method whereby characteristics of various materials can be evaluated easily and quickly with good accuracy and certainty even if the materials are present in little amounts. SOLUTION: A solution or gas is provided in contact with the sensor surface 5 of a light scan type two-dimensional concentration distribution measuring device having a sensor surface 7 on one side of a semiconductor substrate 5 and designed to apply probing light 3 to the semiconductor substrate 5. Microscopic changes in the distribution of material concentrations or a physical- property parameters, which are caused inside the solution 24 or gas 43 when a material 23 to be evaluated is provided in contact with the solution 24 or gas 43, are detected. |
申请公布号 |
JPH10311818(A) |
申请公布日期 |
1998.11.24 |
申请号 |
JP19970136192 |
申请日期 |
1997.05.10 |
申请人 |
CHIKYU KANKYO SANGYO GIJUTSU KENKYU KIKO;HORIBA LTD |
发明人 |
NOMURA SATOSHI;TAKAMATSU SHUJI;NAKAO MOTOI |
分类号 |
G01N27/416;G01N27/00;G01N27/30 |
主分类号 |
G01N27/416 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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