发明名称 MATERIAL EVALUATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a material evaluating method whereby characteristics of various materials can be evaluated easily and quickly with good accuracy and certainty even if the materials are present in little amounts. SOLUTION: A solution or gas is provided in contact with the sensor surface 5 of a light scan type two-dimensional concentration distribution measuring device having a sensor surface 7 on one side of a semiconductor substrate 5 and designed to apply probing light 3 to the semiconductor substrate 5. Microscopic changes in the distribution of material concentrations or a physical- property parameters, which are caused inside the solution 24 or gas 43 when a material 23 to be evaluated is provided in contact with the solution 24 or gas 43, are detected.
申请公布号 JPH10311818(A) 申请公布日期 1998.11.24
申请号 JP19970136192 申请日期 1997.05.10
申请人 CHIKYU KANKYO SANGYO GIJUTSU KENKYU KIKO;HORIBA LTD 发明人 NOMURA SATOSHI;TAKAMATSU SHUJI;NAKAO MOTOI
分类号 G01N27/416;G01N27/00;G01N27/30 主分类号 G01N27/416
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