NOVEL HIGH-MOLECULAR SILICONE COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST MATERIAL, AND PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a high-molecular silicone compd. that is suitable for a base resin of a resist useful for fine processing with an electron beam or ultraviolet rays since it has phenolic hydroxyl groups a part of which have hydrogen atoms replaced by acid-unstable groups and a part of the rest of which have been crosslinked intramolecularly and/or intermolecularly by crosslinking groups having C-O-C groups. SOLUTION: This silicone compd. has repeating units of the formula (wherein Me is methyl; x is 1-5; 0.001<=y<=0.05; and z is 1-3) and a wt. average mol.wt. of 5,000-50,000. In the compd., a part of phenolic hydroxyl groups have hydrogen atoms replaced by acid-unstable groups and a part of the rest of the hydroxyl groups are crosslinked intramolecularly and/or intermolecularly by crosslinking groups having C-O-C groups and formed by the reaction of an alkenyl ether compd. with a halogenated alkyl ether compd. The sum of amts. of the acid- unstable group and the crosslinking group is higher than 0 mol.% and not higher than 80 mol.% of the amt. of phenolic hydroxyl group.