| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray exposing device mounting magnification correcting device, capable of precisely executing magnification correction by avoiding changing the changing rate of magnification correction even if the posture of a mask changes. SOLUTION: A mask 1 with a mask membrane 2 is chucked to a maskθstage 5 and mounted to a mask tilt stager 6, and magnification correction mechanisms 7 executing the magnification correction of a pattern by distorting the mask by loading a frame 6 of the mask 1 is mounted to the maskθstage 5. Even at the time of changing the attitude of the mask 1 in a direction and a tilting direction at the time of exposure, etc., the mechanisms 7..., which are mounted to the maskθstage 5, changes its attitude in accordance with the change of the mask to keep the direction and the operating point of loading constant so that the magnification of a mask pattern for executing the magnification correction of high reproducibility with respect to the load can be fixed.
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