摘要 |
<p>A substantially compressive stress-free, pin-holes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate into a hot filament chemical vapor deposition reaction chamber, pre-heating the substrate to 400 DEG C.-650 DEG C. in the presence of an inert gas, heating the substrate to 650 DEG C.-700 DEG C. in the presence of hydrogen and carbon compounds, and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.</p> |
申请人 |
MONSANTO CO., ST. LOUIS, MO., US |
发明人 |
GARG, DIWAKAR, MACUNGIE, PA 18062, US;MONK, VYRIL A., MACUNGIE, PA 18062, US;MUELLER, CARL, F. +DI, /, DE |