| 摘要 |
PURPOSE:To provide a process for producing a waveguide type optical device which has a butt connecting structure of waveguide parts varying in functions and is small in the loss in the butt juncture. CONSTITUTION:The thin-film body of the same layer structure as the layer structure of the first waveguide part A1 is formed on the surface of a substrate 1 and the thin- film body part exclusive of the thin-film body part corresponding to the first waveguide part A1 is etched away to expose the surface of the substrate 1 at the time of producing the waveguide type optical device by butt connecting the first waveguide part A1 of the prescribed layer structure and the second waveguide A2 of another layer structure commonly formed on the substrate 1 at respective connecting surfaces B1 on the same substrate 1. The thin-film body of the same layer structure as the layer structure of the second waveguide part A2 is then formed on the exposed surface of the substrate 1 and the first waveguide part and the second waveguide part are butt connected at the respective connecting surfaces B1. A resist mask 17 is formed on the surface exclusive of abnormally grown parts 16 of the crystals projecting on the surface of the boundary of the butt juncture or near the part and 15 then subjected to an etching treatment, by which the abnormally grown parts 16 are removed. |
