发明名称 DEVICE AND PROCESS FOR PRODUCING SiC SINGLE CRYSTALS
摘要 PCT No. PCT/DE94/00311 Sec. 371 Date Sep. 29, 1995 Sec. 102(e) Date Sep. 29, 1995 PCT Filed Mar. 21, 1994 PCT Pub. No. WO94/23096 PCT Pub. Date Oct. 13, 1994SiC single crystals are produced in a reaction chamber, in which there is a seed crystal for the separation of a SiC single crystal from the gas phase. The reaction chamber is connected to a storage chamber, which is at least partly filled with a supply of SiC, by a gas channel with a predetermined cross-section for conveying the SiC in the gas phase. The supply of SiC is sublimated in a heating device and a temperature gradient is adjusted in the reaction chamber. It is, thus, possible to produce SiC single crystals with any desired cross-sectional area and of high crystalline quality and single-crystal yield, because the conveyance rate of the gas molecules can be precisely adjusted.
申请公布号 EP0692037(B1) 申请公布日期 1998.11.18
申请号 EP19940911055 申请日期 1994.03.21
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 VOELKL, JOHANNES;LANIG, PETER
分类号 C30B23/00;C30B23/06;C30B29/36 主分类号 C30B23/00
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