| 摘要 |
PROBLEM TO BE SOLVED: To prevent a positional deviation of substrates by a method wherein after an exposure is performed on the first substrate of a plurality of the substrates, a mask is again aligned with an exposure device. SOLUTION: Substrates 27 in cassettes are subjected to continuous photolithography treatments one sheet by one sheet, whereby the photolithography treatments of the substrates in all the cassettes 7 to 10 are performed. A sensitizing solution is applied on the substrate 27, which is an object of exposure, by a coating unit 3 and the coating finished substrate 27 is carried in an exposure device 1 and is subjected to exposure treatment. Here, the device 1 is aligned with a mask immediately before the substrate 27 in the first cassette is subjected to exposure treatment and immediately before an exposure of the number of sheets of the substrates indicated by a specified communication is completed in the cassette under treatment and an exposure treatment of the following substrate, in short, the first substrate in the following cassette, is performed, the device 1 is again aligned with the mask. |
