发明名称 |
Surface treatment of magnetic recording heads |
摘要 |
Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.
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申请公布号 |
US5838522(A) |
申请公布日期 |
1998.11.17 |
申请号 |
US19970794672 |
申请日期 |
1997.02.03 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
KOMVOPOULOS, KYRIAKOS;BROWN, IAN G.;WEI, BO;ANDERS, SIMONE;ANDERS, ANDRE;BHATIA, C. SINGH |
分类号 |
C04B41/00;C04B41/80;C23C14/32;C23C14/48;G11B5/10;G11B5/187;G11B5/255;G11B5/40;G11B5/60;G11B33/10;(IPC1-7):G11B5/187 |
主分类号 |
C04B41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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