| 发明名称 |
Photosensitive composition |
| 摘要 |
A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.
|
| 申请公布号 |
US5837419(A) |
申请公布日期 |
1998.11.17 |
| 申请号 |
US19960705260 |
申请日期 |
1996.08.29 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
USHIROGOUCHI, TORU;ASAKAWA, KOJI;NAKASE, MAKOTO;SHIDA, NAOMI;OKINO, TAKESHI |
| 分类号 |
C08L61/04;C08L61/10;G03F7/004;G03F7/023;G03F7/033;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C08L61/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
