发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE AND LOW-TEMPERATURE HEAT TREATING DEVICE USED FOR THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To evade a defect in mounting a device chip, and to improve the measurement precision of electric inspection and to shorten a maintenance time. SOLUTION: After a solder film pattern 7a which is connected to an Al-based electrode pad 2 through a ball limiting metal(BLM) film 5 is formed and a low-temperature short-time heat treatment for ohmic connection between those BLM film 5 and solder film pattern 7a is performed, electric inspection is performed by bringing a measuring probe P1 into contact with the solder film pattern 7a under conditions of a diameter of 10μmϕand stylus pressure (overdrive quantity) of 20μm at the tip part. A wet back process for solder ball formation is performed after the electric inspection, so no influence of a probe trace 8a on the finish shape of a final solder ball is recognized and its height uniformity becomes excellent. Therefore, a defect in mounting at the time of the mounting of a flip chip on a printed wiring board is evaded.</p>
申请公布号 JPH10308406(A) 申请公布日期 1998.11.17
申请号 JP19980041589 申请日期 1998.02.24
申请人 SONY CORP 发明人 YANAGIDA TOSHIHARU;NISHIYAMA KAZUO
分类号 H01L21/66;H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L21/66
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