MANUFACTURE OF DIFFRACTION GRATING, SEMICONDUCTOR LASER MANUFACTURED BY USING THE SAME, AND LIGHT APPLYING SYSTEM USING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve the reproducibility, mass-productivity, and single-mode selectivity of a diffraction grating by forming an inverted pattern by etching back a photoresist and forming a phase-inverted diffraction grating on the surface of a crystal by using a resist pattern and a silicon oxide film pattern. SOLUTION: A buried photoresist pattern 10 is obtained by etching back a photoresist until the surface of a silicon oxide film pattern 7 is exposed. Then a pattern having the periodicity of silicon oxide film pattern 7 and the inverted photoresist pattern 10 is formed by etching the exposed silicon oxide film pattern 7 by using a resist pattern 11 for etching mask formed in a prescribed area as an etching mask and stripping off the resist pattern 11. Thereafter, a phase-shifting diffraction grating 12 is obtained by etching the surface of a substrate 1 by using the pattern as a mask and removing the etching mask.