| 摘要 |
PROBLEM TO BE SOLVED: To obtain a compsn. having extremely small absorption for a light source in short wavelengths and showing excellent solubility, alkali developing property and resistance against dry etching by incorporating a base resin, a photoacid producing agent and a specified compd. SOLUTION: This compsn. contains a base resin, a photoacid producing agent and a compd. expressed by the formula R<1> -X<1> -R<2> . In the formula, R<1> is a univalent org. group, X<1> is selected from >C=O, -C(=O)O-, -CONR<3> - and -SO2 -, wherein R<3> is a hydrogen atom, halogen atom or hydrocarbon group, R<2> is a group containing an alicyclic structure and the atom in R<2> which is directly bonded to X<1> is tertiary carbon. The alicyclic structure in R<2> consists of a single ring or 2 to 10 rings containing carbon atoms and one kind of atom selected from oxygen atom, nitrogen atom and sulfur atom and having 3 to 100 whole atoms. |
