发明名称 LASER DEVICE, ALIGNER, LITHOGRAPHY SYSTEM AND ELEMENT MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To lighten the burden on management, the reduce the cost, etc. SOLUTION: Gas flow adjusting systems 38a-38d can adjust the flow rates of the gas from a plurality of gas supply sources 34a-34d each prior to supply to laser beam sources 36a-36d, so the concentration of gas optimum for the laser beams 36a-36d can be materialized by the proper combination of the gas supply sources for the single gas such as medium gas, buffer gas, etc., or mixed gas between gas of these media and buffer gas. Especially, in case that the laser sources are two or more, different laser beam sources 36a-36d can be supplied with gas from the same gas supply sources 34a-34d so long as it is of the same kind, so the constitution of gas supply facilities can be simplified, and especially, in case that noxious gas (for example, fluorine) or the like is contained in the medium gas, the supply sources of the noxious gas can be minimum, therefore it becomes possible to contrive the lightening of the burden on management, the reduction of cost, etc.
申请公布号 JPH10303482(A) 申请公布日期 1998.11.13
申请号 JP19970123328 申请日期 1997.04.25
申请人 NIKON CORP 发明人 ATSUMI SHINOBU;HAMAYA MASATO
分类号 G03F7/20;H01L21/027;H01S3/036;H01S3/225;H01S3/23;(IPC1-7):H01S3/036 主分类号 G03F7/20
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