| 摘要 |
A method of introducing gas into a substrate processing chamber. The method of introducing gas into a substrate processing chamber comprises the steps of filling a gas metering area with the gas to a first predetermined pressure, closing the area to maintain the area at the first predetermined pressure and opening the area to the substrate processing chamber. When the area is opened to the substrate processing chamber, the gas inside the area will expand into the chamber to provide the chamber with a second predetermined pressure. |
