发明名称 VACUUM TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment equipment capable of practically increasing the pressure of a transferring chamber up to a target pressure atmosphere in a short time. SOLUTION: A gas supplying path 114 is connected with a common transferring chamber 102. An opening and closing valve 116, a gas charging chamber 118, a flow rate adjusting valve 120 and a regulator 112 are sequentially interposed in the gas supplying path 114, and the gas supplying path 114 is connected with a gas supplying source 124. A vacuumizing mechanism P128 is connected with the common transferring chamber 102 via a gas discharging path 126. When the opening and closing valve 116 is released by a specified trigger signal from a controller 132, specified waiting gas in the gas charging chamber 118 is supplied in the common transferring chamber 102, and pressure in the common transferring chamber 102 is increased up to a specified target pressure atmosphere.
申请公布号 JPH10303279(A) 申请公布日期 1998.11.13
申请号 JP19970126268 申请日期 1997.04.30
申请人 TOKYO ELECTRON LTD 发明人 ISHIZAWA SHIGERU;SASAKI YOSHIAKI;KONDO KEISUKE;YOSHIDA TETSUO
分类号 C23C14/24;C23C14/56;C23C16/44;C23C16/455;C23C16/54;C23F4/00;H01L21/00;H01L21/02;H01L21/203;H01L21/205;H01L21/677;(IPC1-7):H01L21/68 主分类号 C23C14/24
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