| 摘要 |
PROBLEM TO BE SOLVED: To provide the resist composition high in sensitivity and resolution and capable of forming a positive or negative pattern superior in dimensional control by adding a compound converted into a heat-decomposable ester by reaction with an acid produced by decomposition of an acid precursor, and after exposure, producing an acid by heat treatment. SOLUTION: The resist composition contains the compound converted into the heat-decomposable ester by reaction with the acid produced by decomposition of the acid precursor, and after exposure; producing an acid by heat treatment, a medium having reactivity of changing alkali solubility by an acid- catalyzed reaction and a compound to be allowed to produce an acid by irradiation with activated chemical rays. The compound convertible into the heat- decomposable ester by the acid catalyst is the ones having one kind of structure selected from acetals and ketals to be used in an amount of 3-30 weight % of the total solids of the resist, thus permitting the obtained pattern to be high in sensitivity and resolution and superior in dimensional controllability. |
