LOW DENSITY FILM FOR LOW DIELECTRIC CONSTANT APPLICATIONS

摘要

A film having a dielectric constant of less than 3 (most preferably less than 2) and comprising a layer of particles and a deposit on top of and within the particle layer, and a method of making same. The particles are agglomerated particles, hollow particles, porous particles, or a combination thereof. The film is substantially planar on its surface, and the film is substantially impermeable to gases. The method comprises coating a substrate with the particles (preferably spin-coating a colloidal solution); drying the particles to form a substantially uniform particle layer; depositing a deposit onto the particle layer (preferably by low pressure chemical vapor deposition and causing chemical vapor infiltration to bond the particles to the substrate); and optionally polishing/planarizing the deposit surface (preferably by chemical mechanical polishing).