An electron beam lithography system

摘要

An electron beam lithography system (10) and method for directly writing onto writing fields (50) provided on a wafer (12). The system (10) includes a scanning electron microscope (18) and a processing unit (14) connected to the scanning electron microscope (18). The processing unit (14) controls software (16) for aligning the electron beam with the writing fields (50) without moving the wafer (12).