Magnetron source with magnet assembly

摘要

In a magnetron source for use in a plasma system for sputtering a surface of a target (16) a first magnet assembly (100) generates a magnetic field which over an area in front of the target (16) is confined primarily to an inner region of that area. The inner region of the area in front of the target (16) is surrounded by an outer region. A second magnet assembly (102) generates a magnetic field which over the area in front of the target (16) is confined primarily to the outer region of the surface of the target (16). <IMAGE>