Catadioptric system for photolithography

摘要

Catadioptric systems are provided, comprising a first imaging system, a plane mirror, and a second imaging system. The first imaging system comprises a single-pass optical system and a double-pass optical system that further comprises a concave mirror and a double-pass lens group. The second imaging system comprises a plane mirror and an aperture. The first imaging system forms an intermediate image of an object; the second imaging system re-images the intermediate image on a substrate. The catadioptric systems satisfy various conditions.