| 摘要 |
Method and apparatus are used to determine surface properties. A reflectometer directs an electromagnetic radiation (EMR) source having a plurality of selected wavelengths to a surface of a semiconductor substrate having a known selected surface property. The quantity and variation of reflectance of EMR at each selected wavelength is measured, and a target wavelength therefrom is identified that has the highest variation of reflected EMR. EMR reflectance measurements are then made at the target wavelength on surfaces having unknown surface properties for comparison to that of the original surface. The magnitude of variation in the comparison, based upon a predetermined understanding of such variations, provide an analytical tool by which the surface is analyzed for the selected surface property. With the disclosed technique, reflectance can be used to determine characteristics of each of multiple layers that are deposited in-situ. The disclosed technique is also useful to identify both a pattern and a film on a surface, as a process end point detection tool, and in multiple points analysis on a surface using master and slave reflectometers.
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