发明名称 Semiconductor devices
摘要 A semiconductor device has a semiconductor substrate, a source and a drain region, each formed at the surface of said semiconductor substrate, and each having a potential barrier with respect to the semiconductor substrate. A gate electrode is formed on the semiconductor substrate and positioned between the source and drain regions. The gate electrode controls the height of discrete energy levels of carriers of said semiconductor substrate, and provides a conduction state and a non-conduction state depending upon the existence or non-existence of resonant tunneling current flow.
申请公布号 US5834793(A) 申请公布日期 1998.11.10
申请号 US19960681570 申请日期 1996.07.23
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIBATA, TADASHI
分类号 H01L21/334;H01L21/336;H01L29/08;H01L29/772;H01L29/78;(IPC1-7):H01L29/06 主分类号 H01L21/334
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