| 摘要 |
<p>A pattern-writing machine comprises an electron beam column (11) for generating a deflectable electron beam, a displaceable stage (10) for supporting a substrate (13) to be scanned by the beam for writing a pattern on the substrate, and a displacing system for displacing the stage (10) and thereby the substrate (13) relative to the beam. The displacing system comprises three pairs of struts (15, 16, 17), which support the stage (11) and are individually variable in length, and drive means for varying the strut lengths to move the stage along each of three mutually orthogonal axes (X, Y, Z) and to pivot the stage about each of the three axes. The drive means can take the form of separately operable drives respectively associated with the struts and controlled by measuring systems detecting stage horizontal position, vertical position and attitude.</p> |
