发明名称 METHOD AND APPARATUS FOR ELECTROMAGNETIC EXPOSURE OF PLANAR OR OTHER MATERIALS
摘要 <p>The present invention overcomes many of the problems associated with electromagnetic exposure of planar materials (40). A diagonal slot (36) compensates for the effects of signal attenuation along the propagation path. Adjustably variable path lengths allow peaks (17) and valleys (18) of the electromagnetic field (16) in one exposure segment (30) to compensate for peaks and valleys in another exposure segment. Dielectric slabs may be used to extend the peak field region between top and bottom conducting surfaces (12, 14) to allow for more uniform exposure of planar materials (40) that have a significant thickness (41). Specialized choke flanges prevent the escape of electromagnetic energy. One or more rollers between exposure segments (30) may be enclosed by an outer surface to prevent the escape of electromagnetic energy.</p>
申请公布号 WO1998049870(A1) 申请公布日期 1998.11.05
申请号 US1998007637 申请日期 1998.04.28
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址