| 摘要 |
PROBLEM TO BE SOLVED: To maintain an improved texture structure and at the same time achieve a strong adhesion strength, a high reflection factor, and a low resistance simultaneously, by forming a lower electrode layer with two stages, namely, a first stage for forming film at a high temperature and a second stage for forming film at a lower temperature. SOLUTION: An aluminum electrode layer 13 is formed on an insulation substrate 12 by the DC sputtering method. A substrate temperature is set to 350 deg.C as conditions for DC sputtering. Then, a high-temperature silver electrode layer 14a is formed at a substrate temperature of 350 deg.C by the DC sputtering method and the substrate temperature is reduced to 200 deg.C, thus forming a low- temperature silver electrode layer 14b. After this, a semiconductor layer 15 that becomes a photoelectric conversion layer is formed. Then, a transparent electrode layer 16 that is an upper electrode layer is formed, thus reinforcing the adhesion strength between the electrode layer 13 and the silver electrode layer 14 in aluminum. Also, alloying is suppressed, the silver electrode layer 14 with a high reflection factor is achieved, and an improved texture structure when forming the first electrode layer is formed. |
