发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PROBLEM TO BE SOLVED: To enhance the efficiency of a step-up voltage generation circuit by isolating a second well region formed on a first well region through a third well region and forming an MOSFET for transmitting a step-up voltage to a capacitor on the output side in the second well region thus isolated. SOLUTION: A step-up voltage circuit transmits a step-up voltage to a capacitor on the output side through an MOSFET M1. A second D well region is formed on a first p well region which is isolated through a third n well region and the MOSFET M1 is formed in the second well region pWELL thus isolated. According to the structure, level loss can be reduced by supplying a step-up voltage to the second well region pWELL corresponding to the back gate of the MOSFET M1 thereby preventing the threshold voltage from increasing due to substrate effect.
申请公布号 JPH10294427(A) 申请公布日期 1998.11.04
申请号 JP19970117565 申请日期 1997.04.21
申请人 HITACHI LTD;HITACHI CHIYOU LSI SYST:KK 发明人 TANAKA HITOSHI;KINOSHITA YOSHITAKA;NISHIMOTO KENJI;EBIHARA TAKASHI
分类号 H01L27/04;G11C11/407;H01L21/822;H01L21/8242;H01L27/108 主分类号 H01L27/04
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