发明名称 Nitride semiconductor device
摘要 A nitride semiconductor device has a nitride semiconductor layer structure. The structure includes an active layer (16) of a quantum well structure containing an indium-containing nitride semiconductor. A first nitride semiconductor layer (101) having a band gap energy larger than that of the active layer (16) is provided in contact with the active layer (16). A second nitride semiconductor layer (102) having a band gap energy smaller than that of the first layer (101) is provided over the first layer (101). Further, a third nitride semiconductor layer (103) having a band gap energy larger than that of the second layer (102) is provided over the second layer (102).
申请公布号 EP0772249(A3) 申请公布日期 1998.11.04
申请号 EP19960117792 申请日期 1996.11.06
申请人 NICHIA CHEMICAL INDUSTRIES, LTD. 发明人 NAKAMURA, SHUJI;NAGAHAMA, SHINICHI;IWASA, NARUHITO
分类号 H01L33/02;H01L33/06;H01L33/32;H01S5/20;H01S5/343 主分类号 H01L33/02
代理机构 代理人
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