发明名称 EXHAUST GAS TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an exhaust gas treating device improved so as to replenish a cleaning soln. in a minimum amt. SOLUTION: This exhaust gas treating device 50 is provided with a cleaning tower in which an exhaust gas is introduced and is brought into gas-liq. contact with a cleaning soln. ejectted in a spraying state to clean and purify the exhaust gas, the cleaning soln. is recovered and again brought into gas-liq. contact with the exhaust gas as the cleaning soln. The device is further provided with a cleaning soln. flow control valve 44 provided to a cleaning soln. feed pipe 42, a meter 46 for measuring a hydrogen ion index and a hydrogen ion index controller 48 for controlling the flow rate of a fresh cleaning soln. by the cleaning soln. flow control valve based on the hydrogen ion index measuring value measured by the meter to control the hydrogen ion index of the cleaning soln. to a prescribed value.</p>
申请公布号 JPH10290918(A) 申请公布日期 1998.11.04
申请号 JP19970104312 申请日期 1997.04.22
申请人 SONY CORP 发明人 ADACHI KEN
分类号 B01D53/34;B01D53/18;B01D53/77;(IPC1-7):B01D53/34 主分类号 B01D53/34
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