发明名称 PHOTOSENSITIVE POLYMER COMPOSITION AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive polymer compsn. having high resolution and excellent and stable film characteristics by preparing a polyimide precursor having high mol.wt., and to provide a producing method of the photosensitive polymer compsn. SOLUTION: This photosensitive polymer compsn. consists of (A) a polyimide precursor having 30000 to 70000 average mol.wt., (B) a photopolymn. initiator, (C) a sensitizer, (D) a polymn. inhibitor and (E) a solvent. The polyimide precursor (A) is obtd. by esterifying an aromatic tetracarboxylic acid anhydride and an alcohol having an ethylene-like unsatd. bond, adding an aromatic diamine to the ester, and polymerizing with diphenyl(2,3-dihydro-2-thioxo-3-benzoxazole) phosphonate or its deriv. or diphenyl(2,3-dihydro-2-thioxo-3-benzothiazole) phosphonate or its deriv. as a dehydration condensation agent. In the production of the compsn. above described, the dehydration condensation agent is removed from the obtd. polyimide precursor product and the polyimide precursor is precipitated.
申请公布号 JPH10293403(A) 申请公布日期 1998.11.04
申请号 JP19970117563 申请日期 1997.04.21
申请人 TOSHIBA CHEM CORP 发明人 NOGUCHI YUICHI
分类号 G03F7/004;G03F7/027;G03F7/038;H01L21/027;H01L21/312;(IPC1-7):G03F7/038 主分类号 G03F7/004
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