Prevention of edge stain in silicon wafers by ozone dipping,申请号GB19980019568-传众专利搜索

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发明名称	Prevention of edge stain in silicon wafers by ozone dipping
摘要
申请公布号	GB9819568(D0)	申请公布日期	1998.11.04
申请号	GB19980019568	申请日期	1998.09.09
申请人	SEH AMERICA INC	发明人
分类号	B24B9/00;H01L21/304;H01L21/306;H01L21/316	主分类号	B24B9/00
代理机构		代理人
主权项
地址

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