发明名称 ELECTRODE PLATE FOR PLASMA ETCHING
摘要 PROBLEM TO BE SOLVED: To produce an electrode plate for plasma etching low in generation of fine particles and made of a glassy carbon by forming from the glassy carbon in which a surface roughness of a breaking surface structure has a structural property within a specified range. SOLUTION: In an electrode plate for plasma etching, the surface roughness Rms of a breaking surface is used as a measure indicating the fine structural structure of a glassy carbon and this value is set within the range of 5-30 nm. The range of 5-30 nm of the surface roughness Rms of the breaking surface is characterized in that an amorphous carbon crystal structure being a material characteristic of the glassy carbon has a structural property within a fixed range. When the value of the surface roughness of the breaking surface is lower than 5 nm. resistance to the plasma is lowered and a consumption speed at the time of etching is increased since a developing degree of the fine structural structure is low and an intercrystaline structure is small, on the other and, when the value exceeds 30 nm, a structural unit of the fine structure becomes large and the development of the particles accompanying the consumption is increased.
申请公布号 JPH10291813(A) 申请公布日期 1998.11.04
申请号 JP19970114429 申请日期 1997.04.16
申请人 TOKAI CARBON CO LTD 发明人 MATSUOKA TAKESHI
分类号 C04B35/52;C01B31/02;C23F4/00;H01L21/302;H01L21/3065 主分类号 C04B35/52
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