| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding device capable of performing stable polishing by surely transmitting a driving force from a drive shaft to a top ring while maintaining the freedom degree of the relative slant movement of the top ring and the drive shaft. SOLUTION: A substrate holding device and polishing device is provided with a top ring main body 10 which is opposed to a turn table and holds a substrate, a drive shaft 12 which holds the top ring main body 10 slant-movably through a curved-face bearing, and a transmission mechanism 72 which is installed between the end part of the drive shaft 12 and the top ring main body 10 and transmits a rotating drive force from the drive shaft 12 to the top ring main body 10. Also the transmission mechanism is provided with a drive member extending from the drive shaft 12 side to a specified direction and a driven member extending from the top ring main body 10 side to a position where it is engaged with the drive member when the drive shaft 12 is rotated. For the drive member and driven member, at least two members are arranged as a set so that one member can hold the other in order to restrict the relative movement of the top ring main body 10 and drive shaft 12 in the circumferential direction. |
