| 摘要 |
PROBLEM TO BE SOLVED: To perform a focusing adjustment and a leveling adjustment precisely to a chipped shot which is situated in the peripheral part of a photosensitive substrate. SOLUTION: When a shot region capable of measuring all focus measuring points is exposed, focus values of respective focus measuring points P11 , P12 , P13 ,... after the finish of a focusing adjustment and of a leveling adjustment are stored as offset values. Then, with reference to a chipped shot 13B, an approximate plane LC is found in such a way that focus values in the measurable focus measuring points P11 to P23 become the same value as a stored focus value, and a focusing adjustment and a leveling adjustment are performed in such a way that the approximate plane LC agrees with a reference face (a best focus face in a projection optical system). |
