发明名称 PRODUCTION OF THIN OXIDE CERAMIC FILM
摘要 PROBLEM TO BE SOLVED: To produce a thin oxide ceramic film free from oxygen deficiency and having a compsn. close to the theoretical stoichiometric ratio by forming an amorphous precursor film on a substrate, exposing it to an atmosphere of ozone and carrying out crystallization by firing. SOLUTION: A sol using lead acetate and an organometallic compd. such as titanium tetraisopropoxide as starting materials is prepd., applied on a substrate, dried by heating and dewaxed to form an amorphous precursor film of about O.2 μm. This film is crystallized by firing at a prescribed temp. after exposure to an atmosphere contg. ozone generated by corona discharge in the air or ozone treatment by irradiation with UV in an oxygen-contg. atmosphere. The sol is further applied, dried by heating and dewaxed to form an amorphous film and this film is fired after ozone treatment. These processes are repeated >=2 times to obtain the objective uniform flat crystalline oxide ceramic film having a compsn. close to the theoretical stoichiometric ratio.
申请公布号 JPH10291885(A) 申请公布日期 1998.11.04
申请号 JP19970097760 申请日期 1997.04.15
申请人 SEIKO EPSON CORP 发明人 AOYAMA HIROSHI;KUNO TADAAKI;MIYASHITA SATORU
分类号 C30B1/02;C30B29/32;H01L21/316;H01L37/02;H01L41/187;H01L41/39 主分类号 C30B1/02
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