首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR PLANARIZATION INTERLAYER INSULATING FILM OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR0147648(B1)
申请公布日期
1998.11.02
申请号
KR19950015592
申请日期
1995.06.13
申请人
SAMSUNG ELECTRONICS CO.,LTD
发明人
LEE, SOO-CHUN;KIM, YOUNG-WOOK
分类号
H01L21/311;(IPC1-7):H01L21/311
主分类号
H01L21/311
代理机构
代理人
主权项
地址
您可能感兴趣的专利
DOUBLE BLADED (OPPOSITE) COULTER ASSEMBLY
TELESCOPING LATCHING MECHANISM FOR CASING CEMENTING PLUG
Downhole System and Method for Facilitating Remedial Work
DRILLING TOOL SYSTEM AND METHOD OF MANUFACTURE
SUBSEA ARRANGEMENT
MITIGATING THIEF ZONE LOSSES BY THIEF ZONE PRESSURE MAINTENANCE THROUGH DOWNHOLE RADIO FREQUENCY RADIATION HEATING
Supported Connection Assembly
GEOPHYSICAL SURVEYING
DEVICE FOR COOLING A COMPONENT OF AN ELECTRICAL MACHINE USING COOLING COILS
Apparatus for Cooling Beverages
HEAT DISSIPATING APPARATUS
Wet-End Manufacturing Process for Bitumen-Impregnated Fiberboard
METHOD AND ARRANGEMENT FOR TREATING CHEMICAL PULP
HOOK FOR AUTO-RELEASE SHADE
Optical Fiber Welding Machine
FABRICATION METHOD OF MICROFLUIDIC DEVICES
MULTI-SURFACE APPLIQUEING METHOD FOR MELAMINE CONTAINER
METHODS, SYSTEMS, COMPONENTS, AND COMPOSITIONS FOR SIMULTANEOUSLY TREATING A SUBSTRATE AND ADHERING OR APPLYING A BONDING AGENT THERETO
Optical Device Package And System
PRODUCTION PROCESS FOR A MICROMECHANICAL COMPONENT AND MICROMECHANICAL COMPONENT
