发明名称 |
STACKED INSULATING FILM INCLUDING YTTRIUM OXIDE |
摘要 |
A capacitor, and a method for making the same, are disclosed, wherein one plate (4) of the capacitor comprises silicon. The dielectric material of the capacitor includes a silicon nitride layer (6) disposed adjacent the silicon plate (4), and a layer of yttrium oxide (8) disposed thereover. The second plate (10) of the capacitor is formed over the yttrium oxide layer (8). The silicon nitride (6) provides a barrier to the diffusion of silicon into the yttriun oxide film (8) if the structure is heated, providing for a high dielectric constant capacitor dielectric which has improved leakage characteristics. |
申请公布号 |
KR0148679(B1) |
申请公布日期 |
1998.11.02 |
申请号 |
KR19890017979 |
申请日期 |
1989.12.05 |
申请人 |
TEXAS INSTRUMENTS INC. |
发明人 |
CHEN, IH-CHIN;SHEN, BING W.;BOHLMAN, JAMES G.;TSAI, HUN-LIAN |
分类号 |
H01L27/04;H01G4/20;H01L21/822;H01L21/8242;H01L27/10;H01L27/108;H01L29/92;(IPC1-7):H01L21/82 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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