| 摘要 |
A process-gas supply apparatus for supplying a process gas to a process chamber in which a predetermined processing using the process gas is applied to the object set therein, characterized by comprising a process-gas source (22) for supplying a process gas, a carrier gas source (20) filled with a carrier gas, at least one gas storing section (32) having a predetermined volume and to be filled with the process gas, a carrier-gas introducing pipe (24) connecting the carrier gas source (20) to the process chamber (6) to introduce the carrier gas from the carrier gas source (20) to the process chamber (6), a process-gas releasing pipe (30) connected to the process-gas source (22), a process-gas filling circuit having at least one pipe which connects the at least one gas storing section (32) to the process-gas releasing pipe (30) and is provided with at least one open/shut valve, a process gas releasing circuit having at least one pipe which connects the gas storing section (32) to the carrier-gas introducing pipe (24) and is provided with at least one open/shut valve, a controlling section (70) for controlling not only a communication state between the process-gas releasing pipe (30) and the gas storing section (32) but also a communication state between the carrier-gas introducing pipe (24) and the gas storing section (32), by switchover of the open/shut valves attached to the process-gas filling circuit and the process gas releasing circuit. <IMAGE> |
