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发明名称
Verfahren zum Herstellen von polykristallinem Silizium mit mikrorauher Oberfläche
摘要
申请公布号
DE69130263(D1)
申请公布日期
1998.10.29
申请号
DE1991630263
申请日期
1991.03.20
申请人
NEC CORP., TOKIO/TOKYO, JP
发明人
WATANABE, HIROHITO, TOKYO, JP;TATSUMI, TORU, TOKYO, JP
分类号
H01L21/02;H01L27/108;H01L29/92;(IPC1-7):H01L29/94;H01L29/04;H01L21/20
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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