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发明名称
SELECTIVE ETCHING METHOD OF SILICON OXIDE FILM OF SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH10289896(A)
申请公布日期
1998.10.27
申请号
JP19970097484
申请日期
1997.04.15
申请人
OKI ELECTRIC IND CO LTD
发明人
SHIBATA MAYUMI
分类号
H01L21/306;H01L21/3063;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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