| 摘要 |
A method and apparatus for heating a chemical used in microelectronic device fabrication processes. The apparatus includes a chemical supply and chemical bath for containing a chemical. A temperature sensor senses the temperature of the chemical contained in the chemical bath. A first heater, powered by a first electric power source, heats the chemical while it is being supplied to the chemical bath. A second heater, powered by a second electric power source, heats the chemical contained in the chemical bath. First and second power controllers regulate the first electric power and the second electric power sources, respectively, through a plurality of electrodes having different intensity levels that are selected according to the temperature of the chemical sensed by the temperature sensor.
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